Liner: The studio is made of 3mm high-quality stainless steel liner, welded around arc corners, surface purification treatment, airtight without air leakage, and no dust production inside, suitable for semiconductor wafers, optoelectronics and other clean environments.

Shell: SS41# medium carbon steel plate treated with phosphate film salt and two layers of anti-gloss coating to prevent fine dust.

Sealing: The door seal is made of PTFE double-layer sealing integrated high-temperature resistant rubber strip, which has good sealing, soft, clean and pollution-free.

Thermostat: Japanese FUJI digital intelligent temperature controller, control accuracy ±0.1°C, PID automatic calculation, automatic constant temperature, with temperature sensor disconnection alarm, over-temperature interrupted heating, overshoot suppression, anti-interference, AT self-tuning, temperature deviation correction function, with 8-stage slope heating function.

Temperature sensor: Japanese PT100 platinum resistor, stainless steel armor cover, accuracy ±0.5%, sensitive response, anti-interference, high temperature resistance

Vacuum gauge: Mitsubishi PLC pressure control module with vacuum pressure transmitter with pressure accuracy of 1pa 

Explosion-proof HDMS preparation bottle, equipped with stainless steel liquid medicine pipeline, electromagnetic return valve, vacuum state opening valve automatic liquid injection, safe sealing without leakage. 

More environmentally friendly and safe, HMDS is a toxic chemical, people inhaled after nausea, vomiting, abdominal pain, irritation of the chest, respiratory tract, etc., because the whole process is completed in a closed environment, so no one will come into contact with the liquid medicine and its vapor, it is safer, its exhaust gas is directly pumped by the mechanical pump to the exhaust gas treatment machine, so it will not cause pollution to the environment.

First set the working temperature of the oven, the typical pretreatment procedure is: open the vacuum pump to vacuum, after the vacuum degree in the cavity reaches 5000Pa, start to fill with nitrogen, after charging to 90000Pa, vacuum again, fill nitrogen and purge the purification chamber repeatedly, after reaching the set number of purging, start vacuuming to 2000Pa again, fill the HMDS gas through nitrogen puffing, and stop filling the HMDS liquid after reaching the set time, enter the holding stage, so that the silicon wafer is fully connected with HMDS React. When the set holding time is reached, vacuum evacuation begins again. Nitrogen is filled with nitrogen and then purged to remove the HMDS residue, and the whole operation process is completed after the set number of purging times is reached.